Single Layer WS2 on SiO2/SiProduct Name Name: Single Layer WS2 on SiO2 Si Product Overview The CVD method (chemical vapor deposition) plays an important role in the preparation of disulfide materials, especially for the preparation of two dimensional layered metal disulfides such as molybdenum disulfide MoS2, tungsten disulfide WS2, etc. When preparing disulfide materials, CVD method utilizes gaseous precursors (such as metal source and sulfur source) to undergo chemical

Drug carrier: Due to PLL@Fe2O3 The biocompatibility and ease of surface modification of nanoparticles make them suitable as drug carriers for targeted drug delivery systems

anti-cancer drug

With high resolution

Electronic devices: such as field-effect transistors

Electrochemical biosensors: MoS2 exhibits excellent electrochemical sensing performance due to its large specific surface area

The chemical precipitation method uses homogeneous chemical precursors as the substrate material

which attracted widespread attention and won them the 2010 Nobel Prize in Physics

Catalytic field: Graphylene has excellent catalytic performance

a thin layer of purple phosphorus can be obtained

Name:3X Molecular Sieve

it is the main component of traditional pencil refills

titanium dioxide B-phase material as the negative electrode material can significantly improve the specific capacity and cycling stability of the battery